With the upgrade of WAVELABS’ I-V measurement system as well as the extension of the GUI, it is now possible to measure the I-V characteristics of 1, 2 or 3 cut cells simultaneously during the same flash.
Simultaneous measurement for up to 3 cut cells in one single measurement cycle
Increased yield due to galvanically-isolated separate measurement of I-V characteristics during same light flash
Individual data binning and defect detectionfor each cut cell
Independent I-V data management for each cut cell
Extension of data interface to automation or manufacturing execution system for data binning and data analysis
Same performance data, e.g. repeatability and accuracy, as for the conventional single channel I-V measurement system
Adjustment of line resistance and intensity calibration per position possible
Compatible with EL and IR measurement
Cut-cell measurement (CCM) is available for:
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